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1

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Aman, Johan, Kimmel, Kurt R., Staud, Wolfgang, Fosshaug, Hans A., Hedqvist, Tobias, Harkesjo, Jan, Hogfeldt, Peter, Jacobsson, Marie, Karawajczyk, Andrzej, Karlsson, Johan, Rosling, Mats, Sjoberg, Hen

Year:

2003

Language:

english

File:

PDF, 1010 KB

english, 2003

2

SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Laser PG Performance for 100 nm Photomasks

Rosling, Mats, Karawajczyk, Andrzej, Askebjer, Per, Zerne, Raoul, Carroll, Allen M., Eklund, Robert, Fosshaug, Hans, Sandstrom, Torbjoern, Grenon, Brian J., Kimmel, Kurt R.

Year:

2002

Language:

english

File:

PDF, 1.80 MB

english, 2002

3

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - Improved photomask accuracy with a high-productivity DUV laser pattern generator

Öström, Thomas, Martin, Patrick M., Naber, Robert J., Måhlén, Jonas, Karawajczyk, Andrzej, Rosling, Mats, Carlqvist, Per, Askebjer, Per, Karlin, Tord, Sallander, Jesper, Österberg, Anders

Year:

2006

Language:

english

File:

PDF, 780 KB

english, 2006

4

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Pattern generation with SLM imaging

Sandstrom, Torbjoern, Askebjer, Per, Sallander, Jesper, Zerne, Raoul, Karawajczyk, Andrzej, Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 465 KB

english, 2002

5

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Controlling CD variations in a massively parallel pattern generator

Luberek, Jarek Z., Carroll, Allen M., Sandstrom, Torbjoern, Karawajczyk, Andrzej, Yen, Anthony

Year:

2002

Language:

english

File:

PDF, 269 KB

english, 2002

6

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

Sjoberg, Henrik, Tanabe, Hiroyoshi, Chauvet, Jean-Michel, Harkesjo, Jan, Hogfeldt, Peter, Karawajczyk, Andrzej, Karlsson, Johan, Kjellberg, Lars, Mahlen, Jonas, Beyerl, Angela, Vedenpaa, Jukka, Goodor

Year:

2004

Language:

english

File:

PDF, 683 KB

english, 2004

7

Semiclassical study of ‘double-lambda’ laser without inversion

Andrzej Karawajczyk, Jakub Zakrzewski

Journal:

Optics Communications

Year:

1994

Language:

english

File:

PDF, 1.03 MB

english, 1994

8

Lasers without inversion in a Doppler-broadened medium

Karawajczyk, Andrzej, Zakrzewski, Jakub

Journal:

Physical Review A

Year:

1995

Language:

english

File:

PDF, 235 KB

english, 1995

9

High resolution mass-resolved ion spectroscopy of core excited states of the nitrogen molecule

Karawajczyk, Andrzej

Journal:

Physica Scripta

Year:

1996

Language:

english

File:

PDF, 623 KB

english, 1996

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